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PLASMATHERM 790
    描述
    The system includes 2” and 4” platens
    配置
    790+ RIE CF4 CHF3 Ar O2 N2
    OEM 代工型號說明
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    文檔

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    類別
    Dry / Plasma Etch

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Running


    產品編號:

    127361


    晶圓尺寸:

    未知


    年份:

    2010


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    PLASMATHERM

    790

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過60天前
    listing-photo-a495a5bf23ae4280a595732e04aecb1b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48234/a495a5bf23ae4280a595732e04aecb1b/1ee099d119e44a3eb72d03eec577d8fc_d847078c6ae34eebb4f46669b4a3be5a_mw.jpeg
    listing-photo-a495a5bf23ae4280a595732e04aecb1b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48234/a495a5bf23ae4280a595732e04aecb1b/644667a102124369bc7dca3209c71af8_2c7acaf073a549e6b7f4cbe72dfef304_mw.jpeg
    listing-photo-a495a5bf23ae4280a595732e04aecb1b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48234/a495a5bf23ae4280a595732e04aecb1b/7bfce19448e947a683c26053e8ff1016_423759c3d0dd4d7aba4399e2de5e3324_mw.jpeg
    listing-photo-a495a5bf23ae4280a595732e04aecb1b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48234/a495a5bf23ae4280a595732e04aecb1b/c723505262b04e4ab8d54656fce7ccb4_7f99118abfc24495b29b2367f268cf3b_mw.jpeg
    listing-photo-a495a5bf23ae4280a595732e04aecb1b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/48234/a495a5bf23ae4280a595732e04aecb1b/b838577f9cd04f62855acf66bb42fcc9_eca30699669b4ccbaccd38b3fcb689dd_mw.jpeg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Running


    產品編號:

    127361


    晶圓尺寸:

    未知


    年份:

    2010


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    The system includes 2” and 4” platens
    配置
    790+ RIE CF4 CHF3 Ar O2 N2
    OEM 代工型號說明
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    文檔

    無文檔