描述
Complete, working condtion配置
O2, Ar, CF4, SF6, CHF3. Can use H2 as well.OEM 代工型號說明
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 6 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
142297
晶圓尺寸:
未知
年份:
1993
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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PLASMATHERM
790
類別
Dry / Plasma Etch
上次驗證: 6 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
142297
晶圓尺寸:
未知
年份:
1993
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Complete, working condtion配置
O2, Ar, CF4, SF6, CHF3. Can use H2 as well.OEM 代工型號說明
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.文檔
無文檔