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PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
描述
無描述
配置
Single chamber tool PECVD. 8" In Fab still running.
OEM 代工型號說明
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
文檔

無文檔

PREFERRED
 
SELLER
類別
Dry / Plasma Etch

上次驗證: 超過60天前

Buyer pays 12% premium of final sale price
關鍵商品詳情

條件:

Used


作業狀態:

Installed / Running


產品編號:

105081


晶圓尺寸:

8"/200mm


年份:

1993


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PREFERRED
 
SELLER

PLASMATHERM

790

verified-listing-icon
已驗證
類別
Dry / Plasma Etch
上次驗證: 超過60天前
listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/5ad2b58debc940229c159bf3f866d4d4_59b4b90969234dcbbe54f96996e0f3f91201a_mw.jpeg
listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/91b4691060c84e6e87d70b9e3e098624_b990009bce9f427787210cb7aa9a55401201a_mw.jpeg
listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/0bb4aa0cd6994d2189eb93204e0ba72b_99868a6e16e7413991a9d688d5a807d545005c_mw.jpeg
listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/f3341069044f494fafa36fae6deef07c_57f6981c5a8c4f5588ef7dca2086bfc045005c_mw.jpeg
listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/8b05535cb5fd4a5d81857d4624b002a4_82993e5b7f4a4af49e7369cb282ba54a45005c_mw.jpeg
Buyer pays 12% premium of final sale price
關鍵商品詳情

條件:

Used


作業狀態:

Installed / Running


產品編號:

105081


晶圓尺寸:

8"/200mm


年份:

1993


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
Single chamber tool PECVD. 8" In Fab still running.
OEM 代工型號說明
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
文檔

無文檔