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PLASMATHERM 790
    描述
    無描述
    配置
    Single chamber tool PECVD. 8" In Fab still running.
    OEM 代工型號說明
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    文檔

    無文檔

    類別
    Dry / Plasma Etch

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Running


    產品編號:

    105081


    晶圓尺寸:

    8"/200mm


    年份:

    1993


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    PLASMATHERM

    790

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過60天前
    listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/5ad2b58debc940229c159bf3f866d4d4_59b4b90969234dcbbe54f96996e0f3f91201a_mw.jpeg
    listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/91b4691060c84e6e87d70b9e3e098624_b990009bce9f427787210cb7aa9a55401201a_mw.jpeg
    listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/0bb4aa0cd6994d2189eb93204e0ba72b_99868a6e16e7413991a9d688d5a807d545005c_mw.jpeg
    listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/f3341069044f494fafa36fae6deef07c_57f6981c5a8c4f5588ef7dca2086bfc045005c_mw.jpeg
    listing-photo-4383595d975b41e1ba17ff826a449a59-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/4507/4383595d975b41e1ba17ff826a449a59/8b05535cb5fd4a5d81857d4624b002a4_82993e5b7f4a4af49e7369cb282ba54a45005c_mw.jpeg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    Installed / Running


    產品編號:

    105081


    晶圓尺寸:

    8"/200mm


    年份:

    1993


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Single chamber tool PECVD. 8" In Fab still running.
    OEM 代工型號說明
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    文檔

    無文檔