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PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
  • PLASMATHERM 790
描述
Multi-Process Etch
配置
無配置
OEM 代工型號說明
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
文檔

無文檔

類別
Dry / Plasma Etch

上次驗證: 超過30天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

12709


晶圓尺寸:

8"/200mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

PLASMATHERM

790

verified-listing-icon
已驗證
類別
Dry / Plasma Etch
上次驗證: 超過30天前
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listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/36735c3bb47d1b29ef6d2aed0cfa406d86bd9f1bfdc7b36793b74dbfacc36c09_20200420_094044_f
listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/169053a4a860bce90d30ad7984fb9a12b6290fb8da8de2b5f1f14f3037fe60e2_20200420_094044_f
listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/4b74f70f71c624939e8a8ae35d16e03117e1ae73e6b80bbaddf8dd04f7f54325_20200420_094044_f
listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/7e537f99bd27518a521a0d2e46b5904163844085f7caf3abbcc5d008ce6afc0d_20200420_094044_f
listing-photo-3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/XZEyGkZyJ-9yXLpkbQ-beQw-yasZQLH-Iuh31A5-AYA/3feabbbb771ba7fa2401fe48e8ebab325e0725a007e76278dafbff4a9c158c61/424472d4daead688216520dd21cc6be5d6478d3cd09f9b785849fcda4b1d5258_20200420_094044_f
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

12709


晶圓尺寸:

8"/200mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Multi-Process Etch
配置
無配置
OEM 代工型號說明
The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
文檔

無文檔