描述
Mask aligner Suss MJB 3 HP 350 W High pressure system配置
Accuracy (resolution): 0.5 µm 350W Lamphouse incl. UV 300/400 Exposure Optics Lamp Power Supply CIC 500 Exposure Timer Single field Microscope with Turret of 3 Objectives Binocular Tube with 2 Oculars X,Y, Theta Alignment Stage Fine adjustment with Micrometer Screws Chuck up to 3“ Wafer and Maskholder for up to 4“ Mask Pneumatic BoxOEM 代工型號說明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."文檔
無文檔
類別
Mask/Bond Aligners
上次驗證: 19 天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
145110
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SUSS MicroTec / KARL SUSS
MJB3
類別
Mask/Bond Aligners
上次驗證: 19 天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
145110
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Mask aligner Suss MJB 3 HP 350 W High pressure system配置
Accuracy (resolution): 0.5 µm 350W Lamphouse incl. UV 300/400 Exposure Optics Lamp Power Supply CIC 500 Exposure Timer Single field Microscope with Turret of 3 Objectives Binocular Tube with 2 Oculars X,Y, Theta Alignment Stage Fine adjustment with Micrometer Screws Chuck up to 3“ Wafer and Maskholder for up to 4“ Mask Pneumatic BoxOEM 代工型號說明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."文檔
無文檔