描述
The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter. - Microscope: M400 Normalfield with revolving objective turret and trinocular microscope head - Microscope Objectives: Leitz NPL 5X, 10X, and 20X objectives - Microscope Oculars: 10X eyepieces - Lamphouse: 350W lamphouse - Lamp: 350W High Pressure Mercury (Hg) lamp is currently installed - Exposure Optics: UV400 - Optical Sensor: CH1: 365nm, CH2: 405nm - Timer: Digital - CIC Power Supply: CIC 1000 constant intensity controller NOTE: THIS MJB 3 CAN ALSO BE ORDERED FOR THE FOLLOWING CONFIGURATIONS: DUV APPLICATIONS (254nm) IR ALIGNMENT. PLEASE CONTACT US FOR DETAILS AND PRICING - Tooling: Includes one (1) set of standard mask holder and matching wafer alignment chuck to customer''s desired wafer size - Vib/Iso Table: Sold separately; subject to availability at time of order配置
無配置OEM 代工型號說明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."文檔
無文檔
類別
Mask/Bond Aligners
上次驗證: 29 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
125838
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SUSS MicroTec / KARL SUSS
MJB3
類別
Mask/Bond Aligners
上次驗證: 29 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
125838
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter. - Microscope: M400 Normalfield with revolving objective turret and trinocular microscope head - Microscope Objectives: Leitz NPL 5X, 10X, and 20X objectives - Microscope Oculars: 10X eyepieces - Lamphouse: 350W lamphouse - Lamp: 350W High Pressure Mercury (Hg) lamp is currently installed - Exposure Optics: UV400 - Optical Sensor: CH1: 365nm, CH2: 405nm - Timer: Digital - CIC Power Supply: CIC 1000 constant intensity controller NOTE: THIS MJB 3 CAN ALSO BE ORDERED FOR THE FOLLOWING CONFIGURATIONS: DUV APPLICATIONS (254nm) IR ALIGNMENT. PLEASE CONTACT US FOR DETAILS AND PRICING - Tooling: Includes one (1) set of standard mask holder and matching wafer alignment chuck to customer''s desired wafer size - Vib/Iso Table: Sold separately; subject to availability at time of order配置
無配置OEM 代工型號說明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."文檔
無文檔