描述
Mask Aligner配置
KARL SUSS MJB3 Type:10000003 Power 220v/50Hz/500VA UV400 Optics Lamp House 200 watt Operation Modes: Soft Contact/Hard Contact Chuck for 3” wafers and Mask Holder for 4” masks Single Microscope with 3 objectives X5, X10, X20 (Includes illumination power supply) UV Power Supply 1000watt, (For the mercury lamp) with offboard Ignition Box. Operation/Service Manual (soft pdf file)OEM 代工型號說明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."文檔
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SUSS MicroTec / KARL SUSS
MJB3
已驗證
類別
Mask/Bond Aligners
上次驗證: 2 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
66669
晶圓尺寸:
3"/75mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SUSS MicroTec / KARL SUSS
MJB3
類別
Mask/Bond Aligners
上次驗證: 2 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
66669
晶圓尺寸:
3"/75mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Mask Aligner配置
KARL SUSS MJB3 Type:10000003 Power 220v/50Hz/500VA UV400 Optics Lamp House 200 watt Operation Modes: Soft Contact/Hard Contact Chuck for 3” wafers and Mask Holder for 4” masks Single Microscope with 3 objectives X5, X10, X20 (Includes illumination power supply) UV Power Supply 1000watt, (For the mercury lamp) with offboard Ignition Box. Operation/Service Manual (soft pdf file)OEM 代工型號說明
"The MJB 3 is perfect or photolithography R&D. The product line offers flexibility in handling irregularly shaped substrates and pieces of different thickness, as well as standard size wafers up to 3"". Various configurations are available see individual listings for more details on light sources and alignment modes. The MBJ 3 offers three exposure modes: HP (high precision), ST (standard), SOFT CONT (soft contact). Capabilities: exposure of thin and thick resist materials, ultimate resolution ~ 1μm, substrates up to 75mm in diameter, masks up to 100 mm x 100 mm in size."文檔
無文檔