
描述
Rapid Thermal Anneal (RTA) System配置
無配置OEM 代工型號說明
The 3000 RTP system is the advanced generation RTP tool available with dual side heating to minimize pattern induced thermal non-uniformity and to achieve fast ramp rates of up to 250(degrees)C per second. The 3000 RTP system can be configured for both 200 mm and 300 mm wafers and its applications include ultra-shallow junction formation, implant annealing, cobalt silicide formation and oxinitride formation.文檔
無文檔
類別
RTP/RTA
上次驗證: 昨日
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
137408
晶圓尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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3000
類別
RTP/RTA
上次驗證: 昨日
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
137408
晶圓尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Rapid Thermal Anneal (RTA) System配置
無配置OEM 代工型號說明
The 3000 RTP system is the advanced generation RTP tool available with dual side heating to minimize pattern induced thermal non-uniformity and to achieve fast ramp rates of up to 250(degrees)C per second. The 3000 RTP system can be configured for both 200 mm and 300 mm wafers and its applications include ultra-shallow junction formation, implant annealing, cobalt silicide formation and oxinitride formation.文檔
無文檔