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PERKIN ELMER 4400
    描述
    It is strictly an RF system. Operational. It can handle up to three targets and the backing plates are not with the system.
    配置
    無配置
    OEM 代工型號說明
    The Perkin-Elmer 4400 Series is a fast cycle, water-cooled load locked system that uses circular or delta style cathodes. It has the advantage of eliminating the need to vent the process chamber for loading and unloading substrates, reducing pump down time, contamination, and target burn-in. This increases material utilization. The system is a general-purpose sputtering system with up to four 8 inch diameter circular cathodes that can use DC Magnetron, RF Magnetron, or RF Diode configurations. These can be sputtered sequentially without breaking vacuum. Power sources are available up to 2 kW RF and 5 kW DC.
    文檔

    無文檔

    類別
    PVD / Sputtering

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    49030


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    PERKIN ELMER

    4400

    verified-listing-icon
    已驗證
    類別
    PVD / Sputtering
    上次驗證: 超過60天前
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    listing-photo-06376f3faf414936a00b64e39b8b4fa9-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1674/06376f3faf414936a00b64e39b8b4fa9/7372ff924b024a4b9566f7dd8bdaddcb_5570b25952414506a7d0ad6b666d4904_mw.jpeg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    49030


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    It is strictly an RF system. Operational. It can handle up to three targets and the backing plates are not with the system.
    配置
    無配置
    OEM 代工型號說明
    The Perkin-Elmer 4400 Series is a fast cycle, water-cooled load locked system that uses circular or delta style cathodes. It has the advantage of eliminating the need to vent the process chamber for loading and unloading substrates, reducing pump down time, contamination, and target burn-in. This increases material utilization. The system is a general-purpose sputtering system with up to four 8 inch diameter circular cathodes that can use DC Magnetron, RF Magnetron, or RF Diode configurations. These can be sputtered sequentially without breaking vacuum. Power sources are available up to 2 kW RF and 5 kW DC.
    文檔

    無文檔