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PERKIN ELMER 4400
  • PERKIN ELMER 4400
  • PERKIN ELMER 4400
  • PERKIN ELMER 4400
描述
無描述
配置
無配置
OEM 代工型號說明
The Perkin-Elmer 4400 Series is a fast cycle, water-cooled load locked system that uses circular or delta style cathodes. It has the advantage of eliminating the need to vent the process chamber for loading and unloading substrates, reducing pump down time, contamination, and target burn-in. This increases material utilization. The system is a general-purpose sputtering system with up to four 8 inch diameter circular cathodes that can use DC Magnetron, RF Magnetron, or RF Diode configurations. These can be sputtered sequentially without breaking vacuum. Power sources are available up to 2 kW RF and 5 kW DC.
文檔

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PREFERRED
 
SELLER
類別
PVD / Sputtering

上次驗證: 超過60天前

Buyer pays 12% premium of final sale price
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

79912


晶圓尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PREFERRED
 
SELLER

PERKIN ELMER

4400

verified-listing-icon
已驗證
類別
PVD / Sputtering
上次驗證: 超過60天前
listing-photo-56bf6d7b4c864ae5a01d0c63d45e9959-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Buyer pays 12% premium of final sale price
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

79912


晶圓尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
無配置
OEM 代工型號說明
The Perkin-Elmer 4400 Series is a fast cycle, water-cooled load locked system that uses circular or delta style cathodes. It has the advantage of eliminating the need to vent the process chamber for loading and unloading substrates, reducing pump down time, contamination, and target burn-in. This increases material utilization. The system is a general-purpose sputtering system with up to four 8 inch diameter circular cathodes that can use DC Magnetron, RF Magnetron, or RF Diode configurations. These can be sputtered sequentially without breaking vacuum. Power sources are available up to 2 kW RF and 5 kW DC.
文檔

無文檔