描述
SINGLE WAFER HIGH CURRENT IMPLANTER配置
無配置OEM 代工型號說明
The VIISta HCP series is a high current single wafer ion implanter that offers high productivity and excellent contamination performance. It features implant angle accuracy, beam steering correction, and high-tilt angle capability, making it suitable for advanced device fabrication. With its excellent process control capability, the VIISta HCP is ideal for advanced ultra shallow junction applications such as source/drain, source/drain extension, gate doping, pre-amorphization, and materials modification. It has an energy range of 200 eV to 60 keV and a dose range of 1 x 10^13 to 5 x 10^16 ions/cm^-2.文檔
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APPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
已驗證
類別
High Current
上次驗證: 28 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
111597
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
Available
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查看全部APPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
類別
High Current
上次驗證: 28 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
111597
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
SINGLE WAFER HIGH CURRENT IMPLANTER配置
無配置OEM 代工型號說明
The VIISta HCP series is a high current single wafer ion implanter that offers high productivity and excellent contamination performance. It features implant angle accuracy, beam steering correction, and high-tilt angle capability, making it suitable for advanced device fabrication. With its excellent process control capability, the VIISta HCP is ideal for advanced ultra shallow junction applications such as source/drain, source/drain extension, gate doping, pre-amorphization, and materials modification. It has an energy range of 200 eV to 60 keV and a dose range of 1 x 10^13 to 5 x 10^16 ions/cm^-2.文檔
無文檔