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PLASMATHERM 790
    描述
    無描述
    配置
    PECVD
    OEM 代工型號說明
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
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    PLASMATHERM

    790

    verified-listing-icon

    已驗證

    類別
    Dry / Plasma Etch

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    100286


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
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    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch
    年份: 0條件: 二手
    上次驗證5 天前

    PLASMATHERM

    790

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過60天前
    listing-photo-64bd9918ae82471ab3b0168a3a17208a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    100286


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    PECVD
    OEM 代工型號說明
    The Plasma-Therm 790 series is a self-contained Reactive Ion Etching (RIE) system that features a showerhead gas distribution system and a water-cooled RF platen. This system is capable of etching silicon, silicon dioxide, and silicon nitride. The chamber can achieve a base pressure in the range of 3x10-5 Torr and can operate within a pressure range of 10mTorr to 100mTorr. The system is controlled by a PC and offers both manual and automatic operation modes. It has four process gases available: CF4, CHF3, SF6, and O2.
    文檔

    無文檔

    類似上架商品
    查看全部
    PLASMATHERM 790

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    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch年份: 1993條件: 二手上次驗證:13 天前
    PLASMATHERM 790

    PLASMATHERM

    790

    Dry / Plasma Etch年份: 0條件: 翻新的上次驗證:超過60天前