描述
Hardware Configuration : - 3 Dep. PLIS (Precision Liquid Injection System) Chamber - 1 Sputter Etch Chamber - Parts and Modules : (1) 1-Delatech Scrubber Model 859(non-recirc) (2) 1-Main power box w/4 ENI RF Generators (3) 1-Delta RF generator rack w/3 RFPP generators (4) 1-AMAT '0' Heat exchanger (5) 1-Front monitor (6) 1-Rear monitor (7) 3-50x20 Ebara pumps (Refurbished) (8) 2-40x20 Ebara pumps (Refurbished) (9) 1-Mini controller配置
SiO2 CVD (including dry pumps (5 Ea.), Scrubber, etc.)OEM 代工型號說明
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.文檔
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APPLIED MATERIALS (AMAT)
P5000 CVD
已驗證
類別
CVD
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
51182
晶圓尺寸:
8"/200mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
P5000 CVD
已驗證
類別
CVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
51182
晶圓尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Hardware Configuration : - 3 Dep. PLIS (Precision Liquid Injection System) Chamber - 1 Sputter Etch Chamber - Parts and Modules : (1) 1-Delatech Scrubber Model 859(non-recirc) (2) 1-Main power box w/4 ENI RF Generators (3) 1-Delta RF generator rack w/3 RFPP generators (4) 1-AMAT '0' Heat exchanger (5) 1-Front monitor (6) 1-Rear monitor (7) 3-50x20 Ebara pumps (Refurbished) (8) 2-40x20 Ebara pumps (Refurbished) (9) 1-Mini controller配置
SiO2 CVD (including dry pumps (5 Ea.), Scrubber, etc.)OEM 代工型號說明
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.文檔
無文檔