描述
- Model: Mark 40C - Process Chamber Dimensions: 26” x 26” - CHA SR-10 E-Beam Power Supply (10kW) - CHA T271-4-1 Electron Beam Source - Crucible: 4 pockets, 15cc each - CHA Beam Sweep Controller - CHA Auto Tech-2 Pump Cycle Controller - Blade Position Controller - Fixture Control and Shutter Controller - E.B. Gun Rotation Controller - RGA Valve Control - Substrate Heat - 10kW Heater Power Supply (CHA HPS-671-10) - Sycon STC-200/SQ Deposition Rate Controller - Granville Philips 307 Vacuum Gauge Control - MKS Type 250 Pressure/Flow Controller - Neslab CFT-150 Chillers, Qty 2 - CTI-Cryogenics 8500 Compressor - Edwards E2M40 2-Stage Vacuum Pump - Liquid Nitrogen Level Control配置
6 Pocket E-Gun Inficon CI-100 Ebeam Pocket Control Indexer Ti, Ni, Au, Pd/Pt, Al/Ge, Cu/CrOEM 代工型號說明
The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.文檔
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CHA
MARK 40
已驗證
類別
Thermal Evaporators
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
81698
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CHA
MARK 40
類別
Thermal Evaporators
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
81698
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
- Model: Mark 40C - Process Chamber Dimensions: 26” x 26” - CHA SR-10 E-Beam Power Supply (10kW) - CHA T271-4-1 Electron Beam Source - Crucible: 4 pockets, 15cc each - CHA Beam Sweep Controller - CHA Auto Tech-2 Pump Cycle Controller - Blade Position Controller - Fixture Control and Shutter Controller - E.B. Gun Rotation Controller - RGA Valve Control - Substrate Heat - 10kW Heater Power Supply (CHA HPS-671-10) - Sycon STC-200/SQ Deposition Rate Controller - Granville Philips 307 Vacuum Gauge Control - MKS Type 250 Pressure/Flow Controller - Neslab CFT-150 Chillers, Qty 2 - CTI-Cryogenics 8500 Compressor - Edwards E2M40 2-Stage Vacuum Pump - Liquid Nitrogen Level Control配置
6 Pocket E-Gun Inficon CI-100 Ebeam Pocket Control Indexer Ti, Ni, Au, Pd/Pt, Al/Ge, Cu/CrOEM 代工型號說明
The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.文檔
無文檔