CHA Mark 50 Systems have become the industry standard for high vacuum deposition systems. Simplicity in design, ease of operation and unmatched reliability make the Mark 50 an excellent choice for a wide range of applications. The Mark 50's horizontal 32" by 32" water-cooled cylindrical chamber simplifies loading and unloading. The unique slide down front door minimizes floor space requirements and a rear door offers easy chamber access from behind for convenient through the wall mounting. SECS/GEM and CE compliant.

-Dual Operation, Sputtering and Evaporation
-Moving substrates
-Exceptional Film Uniformity (Fixture Dependent)
-Sputter Up
-Process Stations
-Round Cathodes, RF or DC (Up to 4 Stations)
-Co-deposit
-Bias, RF or DC
-Substrate heating, 400°C, multi-element
-Substrate heating, station
-Electron beam
-Thermal
-Ion beam pre-clean/etch
-Plasma texturing/etch

MARK 50

RESOLUTION

SE-600

SEC 600-RAP

Vacuum deposition systems offering efficiency, flexibility

Dual Operation, Sputtering and Evaporation
Moving substrates
Exceptional Film Uniformity (Fixture Dependent)
Sputter Up
Process Stations



MARK 40

SEC 1000

SE 1000

SE 600 RAP

TEMESCAL FC1800

1000-32

The CHA Mark 50 is a high vacuum deposition system that has become the industry standard due to its simplicity in design, ease of operation and unmatched reliability. It’s an excellent choice for a wide range of applications. he CHA Mark 50 has a horizontal 32" by 32" water-cooled cylindrical chamber that simplifies loading and unloading. It also has a unique slide down front door that minimizes floor space requirements and a rear door that offers easy chamber access from behind for convenient through the wall mounting. It is SECS/GEM and CE compliant. Some of its features include dual operation (sputtering and evaporation), moving substrates, exceptional film uniformity (fixture dependent), sputter up process stations, round cathodes (RF or DC, up to 4 stations), co-deposit bias (RF or DC), substrate heating (400°C, multi-element), electron beam, thermal ion beam pre-clean/etch, plasma texturing/etch and power supply options.

MARK 50C

IH-600	

Mark 50 Systems have become the industry standard for high vacuum deposition systems. Simplicity in design, ease of operation and unmatched reliability make the Mark 50 an excellent choice for a wide range of applications. The Mark 50's horizontal 32" by 32" water-cooled cylindrical chamber simplifies loading and unloading. The unique slide down front door minimizes floor space requirements and a rear door offers easy chamber access from behind for convenient through the wall mounting. SECS/GEM and CE compliant.

MARK 50C RH

The CHA MARK 40C-RH is a vacuum deposition system that combines the best features of CHA Industries’ Mark 50 system with a broad array of options. It offers efficiency, flexibility and ease of maintenance. It accommodates a wide variety of deposition equipment, including versatile combinations of deposition sources and substrates fixturing to address virtually any application.

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SE-600

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