描述
Four-pocket gun in the photo has not been rebuilt yet. INSTALL REQUIREMENTS: 100 amps 3 ph (proper grounding very important) Water cooling 80 psi clean dry air N2 for backfill (speeds up pump down time)配置
4 POCKET ELECTRON BEAM GUN CHA SR10 ELECTRON BEAM POWER SUPPLY AUTOTECH II VALVE CONTROLLER CTI 8 CRYOPUMP CTI COMPRESSOROEM 代工型號說明
The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.文檔
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CHA
MARK 40
已驗證
類別
Thermal Evaporators
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
60982
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CHA
MARK 40
類別
Thermal Evaporators
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
60982
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Four-pocket gun in the photo has not been rebuilt yet. INSTALL REQUIREMENTS: 100 amps 3 ph (proper grounding very important) Water cooling 80 psi clean dry air N2 for backfill (speeds up pump down time)配置
4 POCKET ELECTRON BEAM GUN CHA SR10 ELECTRON BEAM POWER SUPPLY AUTOTECH II VALVE CONTROLLER CTI 8 CRYOPUMP CTI COMPRESSOROEM 代工型號說明
The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.文檔
無文檔