描述

無描述

配置

Model : NSR-2205i12D • Temprature: 23°C • Chamber Type :ASAHI N2E-A • NA Variable System : Yes • Reticle Size : 6“(normal) • Reticle microscope : Fix • MAX Field Size : 22mm • PPD : No • Reticle Barcode Reader :No (on RETICLE) • Reticle SMIF : No • Extend R-Library : No • Reticle Case : 6“ ⚫ Wafer : 8 inch Notch ⚫ Pre Alignment2 : Yes ⚫ Wafer Loader : Type3 ⚫ Chip Leveling : Yes ⚫ In-Line : No ⚫ Wafer Carrier Table : Right , Extra ⚫ Alignment sensor : LSA, FIA ⚫ Rack Type : Right i12 Type Rack) ⚫ Body-OP Ruck cable : 3m(normal) ⚫ Wafer edge Exposure : No ⚫ Lamp Power : 2Kw(Normal) ⚫ Illumination : SHRINC3 ⚫ Signal Tower : No

OEM 代工型號說明

"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.