概述

"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.