描述
無描述配置
Illumination WL i-line Illumination uniformity 2.00% or CD unifotmity 400nm Overlay (single machine) 70nm Wafer capacity 3"/2" Reticle compatibility Available Reticle size 5" Lens reduction 1/5OEM 代工型號說明
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.文檔
無文檔
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131913
晶圓尺寸:
未知
年份:
1997
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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NIKON
NSR-2205i11D
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131913
晶圓尺寸:
未知
年份:
1997
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Illumination WL i-line Illumination uniformity 2.00% or CD unifotmity 400nm Overlay (single machine) 70nm Wafer capacity 3"/2" Reticle compatibility Available Reticle size 5" Lens reduction 1/5OEM 代工型號說明
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.文檔
無文檔