描述
無描述配置
Resolution: 0.35µm Reduction ratio: 1:5 Exposure field: 22mm Alignment accuracy: ≦ 70 nm Wafer size: Currently 8 inch notch- can be converted to any sizeOEM 代工型號說明
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.文檔
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NIKON
NSR-2205i11D
已驗證
類別
Steppers & Scanners
上次驗證: 8 天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
115159
晶圓尺寸:
8"/200mm
年份:
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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查看全部NIKON
NSR-2205i11D
類別
Steppers & Scanners
上次驗證: 8 天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
115159
晶圓尺寸:
8"/200mm
年份:
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Resolution: 0.35µm Reduction ratio: 1:5 Exposure field: 22mm Alignment accuracy: ≦ 70 nm Wafer size: Currently 8 inch notch- can be converted to any sizeOEM 代工型號說明
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.文檔
無文檔