描述
MRC 603 693 TES MRC 693 Rebuilt as a TES-600 Fast Cycle Load Lock Sputtering System, Completely Rebuilt by TES (Technical Engineering Services), New Software and Planar Flat Screen Monitor, Advanced Energy Pinnacle II DC Power Supply, GE Fanuc System Automation COntrol Software and Hardware, Also includes RF Power Supply and Matching Network配置
無配置OEM 代工型號說明
The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/Ti文檔
無文檔
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KDF / MRC
603
類別
PVD / Sputtering
上次驗證: 9 天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
138435
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
MRC 603 693 TES MRC 693 Rebuilt as a TES-600 Fast Cycle Load Lock Sputtering System, Completely Rebuilt by TES (Technical Engineering Services), New Software and Planar Flat Screen Monitor, Advanced Energy Pinnacle II DC Power Supply, GE Fanuc System Automation COntrol Software and Hardware, Also includes RF Power Supply and Matching Network配置
無配置OEM 代工型號說明
The MRC 603 is a sputter system designed to deposit thin film metals by DC source. It can hold four 6-inch wafers on a pallet for the process. The tool can be used to deposit aluminum (Al), titanium (Ti), and indium-tin-oxide (ITO) for single or multi-stack films like an Al/Ti文檔
無文檔