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APPLIED MATERIALS (AMAT) P5000 CVD
    描述
    No missing parts
    配置
    SiO2 4 Chambers
    OEM 代工型號說明
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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    已驗證

    類別
    CVD

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    87293


    晶圓尺寸:

    6"/150mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD
    年份: 1995條件: 二手
    上次驗證23 天前

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon
    已驗證
    類別
    CVD
    上次驗證: 超過60天前
    listing-photo-4c1567ae6a784681b197d3ead6881b53-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2000/4c1567ae6a784681b197d3ead6881b53/50eefb62020345879d3cd75b7b4411c5_5fa90bdf0a4545788d4b19fd6d877dd71201a_mw.jpeg
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    87293


    晶圓尺寸:

    6"/150mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    No missing parts
    配置
    SiO2 4 Chambers
    OEM 代工型號說明
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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    無文檔

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