待售二手貨 APPLIED MATERIALS (AMAT) EMAX CT+ CHAMBER

描述

無描述

配置

Turbo pump: Alcatel ATH 1600M Bias: 13.5 MHz(Bias) & 2 MHz(LF Bias) LF Biasa: Daihen RMN-50N1 (p/n : 0190-15322) Source:60 MHz Daihen AMN-30H (p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP 13.56 MHz: ENI GHW-50A (p/n : 0190-15319) 2 MHz: ENI B-5002 (p/n : 0190-15320) 60 HHz: AE Ovation 2760 (p/n : 0190-17779) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: p/n : 0010-24353

OEM 代工型號說明

Well-established in logic, memory, and foundry fabs worldwide, eMAX provides this extensive installed base with extendibility of a proven chamber.For next generation applications, optional hardware refinements (dual-zone gas feed, multiple RF frequencies, and enhanced pumping capability) produce higher etch rates, improved uniformity, and tighter profile control while eliminating wafer-edge effects. To balance selectivity versus etch capability, especially for high aspect ratio etch, eMAX operates in a low pressure/high gas flow regime complemented by process chemistries specifically tailored to optimize resist and baselayer selectivities.Rapid wafer handling, high etch rates, and four-chamber capabilities translate into high productivity. Effective polymer deposition management through temperature controls and plasma confinement facilitates extended production runs. Longer mean time between cleans (>150 RF hours), high system throughput, 90%+ up time, and low consumables costs combine to create a production-proven, reliable, cost-effective etch system.