描述
無描述配置
Turbo pump: Alcatel ATH 1600M Bias RF (13.5 MHz) LF Bias RF (2 MHz):Daihen RMN-50N1 (amat p/n : 0190-15322) Source RF (60 MHz): Daihen AMN-30H (amat p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP 13.56 MHz: ENI GHW-50A (amat p/n : 0190-15319) 2 MHz: ENI B-5002 (amat p/n : 0190-15320) 60 HHz: AE Ovation 2760 (amat p/n : 0190-17779) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: amat p/n : 0010-24353OEM 代工型號說明
Well-established in logic, memory, and foundry fabs worldwide, eMAX provides this extensive installed base with extendibility of a proven chamber.For next generation applications, optional hardware refinements (dual-zone gas feed, multiple RF frequencies, and enhanced pumping capability) produce higher etch rates, improved uniformity, and tighter profile control while eliminating wafer-edge effects. To balance selectivity versus etch capability, especially for high aspect ratio etch, eMAX operates in a low pressure/high gas flow regime complemented by process chemistries specifically tailored to optimize resist and baselayer selectivities.Rapid wafer handling, high etch rates, and four-chamber capabilities translate into high productivity. Effective polymer deposition management through temperature controls and plasma confinement facilitates extended production runs. Longer mean time between cleans (>150 RF hours), high system throughput, 90%+ up time, and low consumables costs combine to create a production-proven, reliable, cost-effective etch system.文檔
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APPLIED MATERIALS (AMAT)
EMAX CT+ CHAMBER
已驗證
類別
Plasma Etch
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
28757
晶圓尺寸:
8"/200mm
年份:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
EMAX CT+ CHAMBER
已驗證
類別
Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
28757
晶圓尺寸:
8"/200mm
年份:
2007
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Turbo pump: Alcatel ATH 1600M Bias RF (13.5 MHz) LF Bias RF (2 MHz):Daihen RMN-50N1 (amat p/n : 0190-15322) Source RF (60 MHz): Daihen AMN-30H (amat p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP 13.56 MHz: ENI GHW-50A (amat p/n : 0190-15319) 2 MHz: ENI B-5002 (amat p/n : 0190-15320) 60 HHz: AE Ovation 2760 (amat p/n : 0190-17779) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: amat p/n : 0010-24353OEM 代工型號說明
Well-established in logic, memory, and foundry fabs worldwide, eMAX provides this extensive installed base with extendibility of a proven chamber.For next generation applications, optional hardware refinements (dual-zone gas feed, multiple RF frequencies, and enhanced pumping capability) produce higher etch rates, improved uniformity, and tighter profile control while eliminating wafer-edge effects. To balance selectivity versus etch capability, especially for high aspect ratio etch, eMAX operates in a low pressure/high gas flow regime complemented by process chemistries specifically tailored to optimize resist and baselayer selectivities.Rapid wafer handling, high etch rates, and four-chamber capabilities translate into high productivity. Effective polymer deposition management through temperature controls and plasma confinement facilitates extended production runs. Longer mean time between cleans (>150 RF hours), high system throughput, 90%+ up time, and low consumables costs combine to create a production-proven, reliable, cost-effective etch system.文檔
無文檔