描述

(KN) epitaxial growth machine No Missing Parts

配置

Vote 208V Full load Amp 12*4" year of manufacture 2010 CACE 5.8.15 Operating System WIN XP Heater votaege 380V MO sourceline TMGa_1 TMGa_2 TMAl_1 CP2Mg_1 CP2Mg_2 TEGa_1 TEGa_2 TMIn_1 TMIn_2 Hydride source line NH3 H2 N2 SiH4

OEM 代工型號說明

The AIXTRON AIX 2800 G4 HT (High-Temperature) is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. It is designed specifically for high-temperature processing and the epitaxial growth of compound semiconductor materials.