描述

-Installed and running -Equipment status: Operational. This machine GaN process. It can be used for both 4-inch and 6-inch wafers (previously used for 4-inch and now producing 6-inch). Only additional purchases of replacement hot plates and related accessories are required. Parts details attached

配置

-Previously, the GaN growth was on 4-inch wafers, now it's on 6-inch wafers, all in six pieces. -Schematic and circuit data for the equipment. -Equipment: Photos of the reaction chamber (upper, inside, and below), and gas source piping with equipment door open. -Human-machine interface software version: EpiTT_TWO. -PLC, SLC, and RF generator details.

OEM 代工型號說明

The AIXTRON AIX 2800 G4 HT (High-Temperature) is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. It is designed specifically for high-temperature processing and the epitaxial growth of compound semiconductor materials.