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TEL / TOKYO ELECTRON TELINDY
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
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    Furnaces / Diffusion

    上次驗證: 12 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    150883


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
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    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion
    年份: 0條件: 二手
    上次驗證12 天前

    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon
    已驗證
    類別
    Furnaces / Diffusion
    上次驗證: 12 天前
    listing-photo-ea58596ae81b43d09ba1fd79fd7faf19-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/51676/ea58596ae81b43d09ba1fd79fd7faf19/672fe4dacba045f0817f4982010dce7b_a0a640b7ecd44c6f878accbda8c4d64645005c_f.jpeg
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    150883


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
    文檔
    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion年份: 0條件: 二手上次驗證:12 天前
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion年份: 0條件: 二手上次驗證:12 天前
    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion年份: 2013條件: 二手上次驗證:超過60天前