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TEL / TOKYO ELECTRON TELINDY
    描述
    ALD SiN
    配置
    ALD SiN
    OEM 代工型號說明
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
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    TEL / TOKYO ELECTRON

    TELINDY

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    已驗證

    類別
    Furnaces / Diffusion

    上次驗證: 超過30天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    51955


    晶圓尺寸:

    12"/300mm


    年份:

    2004

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    Available
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    TEL / TOKYO ELECTRON TELINDY

    TEL / TOKYO ELECTRON

    TELINDY

    Furnaces / Diffusion
    年份: 2006條件: 二手
    上次驗證超過60天前

    TEL / TOKYO ELECTRON

    TELINDY

    verified-listing-icon
    已驗證
    類別
    Furnaces / Diffusion
    上次驗證: 超過30天前
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    51955


    晶圓尺寸:

    12"/300mm


    年份:

    2004


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    ALD SiN
    配置
    ALD SiN
    OEM 代工型號說明
    The TELINDY is a 300mm wafer processing platform that combines the advantages of the TELFORMULA and ALPHA(α)-303i platforms to meet the demands of high-volume thermal processing for sub-45nm technology. It offers a large 125-wafer batch size, high-speed robotics, and other improvements for cost-effective processing of various oxidation and deposited films. The TELINDY platform is suitable for a range of applications, including general oxidation/anneal, radical oxidation, LPCVD films, ultra-low temperature LPCVD applications, and high-k dielectrics. It features in-situ dry gas cleaning technology, a fast ramp-up and cool-down heater, high-speed robotics, and a large 125-wafer load size. These features make the TELINDY an excellent choice for cost-effective and efficient wafer processing.
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