描述
Furnace (FTPS), host station Installed for ONO gate capability, process gases run under engineering.配置
-Base unit ONO process. -Type I deep bay frame -Waves controller -Wafer Diameter: 200 mm -Load: 170 slot boat (150 wfr load size) with boat rotaNon -Heater element: 500C – 1000C -Process gases: NH3, DCS, N2O, N2OEM 代工型號說明
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.文檔
無文檔
類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
91212
晶圓尺寸:
6"/150mm, 8"/200mm
年份:
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
ALPHA-8SE
類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
91212
晶圓尺寸:
6"/150mm, 8"/200mm
年份:
2018
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Furnace (FTPS), host station Installed for ONO gate capability, process gases run under engineering.配置
-Base unit ONO process. -Type I deep bay frame -Waves controller -Wafer Diameter: 200 mm -Load: 170 slot boat (150 wfr load size) with boat rotaNon -Heater element: 500C – 1000C -Process gases: NH3, DCS, N2O, N2OEM 代工型號說明
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.文檔
無文檔