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TEL / TOKYO ELECTRON ALPHA-8SE
    描述
    無描述
    配置
    HI TEMP OXIDE
    OEM 代工型號說明
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    文檔
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    已驗證

    類別
    Furnaces / Diffusion

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    87285


    晶圓尺寸:

    未知


    年份:

    2004


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion
    年份: 2001條件: 二手
    上次驗證超過60天前

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon
    已驗證
    類別
    Furnaces / Diffusion
    上次驗證: 超過60天前
    listing-photo-e312a8202b634fb49b45ae7371b4ae79-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/28362/e312a8202b634fb49b45ae7371b4ae79/5b1afeb872fa416486eb8a057bbc831c_ab1e22bf6783456f8cb09ab406cb8b9b45005c_mw.jpeg
    listing-photo-e312a8202b634fb49b45ae7371b4ae79-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/28362/e312a8202b634fb49b45ae7371b4ae79/1edd2eb29a5a43348243ba40b68b0221_1bea4bf1e34c46eeb8d61daf6320db4e1201a_mw.jpeg
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    listing-photo-e312a8202b634fb49b45ae7371b4ae79-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/28362/e312a8202b634fb49b45ae7371b4ae79/e996386b56b0410e9f547175a641040f_d6b80318eb8f4a7e9ba40a93cdef558d45005c_mw.jpeg
    listing-photo-e312a8202b634fb49b45ae7371b4ae79-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/28362/e312a8202b634fb49b45ae7371b4ae79/54839862278d4b3483a55fded41c3245_523ff6e093c34d4dab7978e881d44ce045005c_mw.jpeg
    listing-photo-e312a8202b634fb49b45ae7371b4ae79-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/28362/e312a8202b634fb49b45ae7371b4ae79/84c6b80e77b34e57a64a44aa674a229d_112888513c7c41b79f845df5e93db57d45005c_mw.jpeg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    87285


    晶圓尺寸:

    未知


    年份:

    2004


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    HI TEMP OXIDE
    OEM 代工型號說明
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    文檔
    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion年份: 2001條件: 二手上次驗證:超過60天前
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion年份: 2002條件: 二手上次驗證:超過60天前
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion年份: 2000條件: 二手上次驗證:超過60天前