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TEL / TOKYO ELECTRON ALPHA-8SE
    描述
    Equipment - Vertical Furnace
    配置
    Process - AP H2 Alloy N2 Purge System - Yes
    OEM 代工型號說明
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    文檔

    TEL / TOKYO ELECTRON

    ALPHA-8SE

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    已驗證

    類別
    Furnaces / Diffusion

    上次驗證: 15 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    103559


    晶圓尺寸:

    8"/200mm


    年份:

    2003

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    Money Back Guarantee
    Available
    Transaction Insured by Moov
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    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion
    年份: 2003條件: 二手
    上次驗證15 天前

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon
    已驗證
    類別
    Furnaces / Diffusion
    上次驗證: 15 天前
    listing-photo-f81e4ff208514f73ae7064bc4f23e123-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2863/f81e4ff208514f73ae7064bc4f23e123/637ee8748b444e6c8b129ffb701cf776_screenshot20240424112239_mw.png
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    103559


    晶圓尺寸:

    8"/200mm


    年份:

    2003


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Equipment - Vertical Furnace
    配置
    Process - AP H2 Alloy N2 Purge System - Yes
    OEM 代工型號說明
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    文檔
    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion年份: 2003條件: 二手上次驗證: 15 天前
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion年份: 2003條件: 二手上次驗證: 超過30天前
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion年份: 0條件: 翻新的上次驗證: 9 天前