描述
MBE MOD System Three Inch wafer, 8 sources. Indium-free 10 sample holders with different profiles. Substrate heater up to 1000 C. Substrate manipulator: power supply, temperature controller, and servo motor control unit. Clean chamber and can be used for any materials. All sources are on 4.5” flanges. Effusion cells can be configured as required. Two valved crackers (as required). RF plasma source for either nitrogen or oxygen. Growth chamber pumps: 400 l/m ion pump and 10” cryo pump. Prep chamber pumps: 220 l/m ion pump. Load lock pumps: Sorption, mechanical, and turbo pumps. Three ion gauges and controllers. RHEED and QMS systems. Pyrometer. New software and PC. Bake out panels.配置
無配置OEM 代工型號說明
未提供文檔
無文檔
類別
Epitaxial deposition (EPI)
上次驗證: 9 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
144927
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VEECO / APPLIED EPI / VARIAN
GEN II
類別
Epitaxial deposition (EPI)
上次驗證: 9 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
144927
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
MBE MOD System Three Inch wafer, 8 sources. Indium-free 10 sample holders with different profiles. Substrate heater up to 1000 C. Substrate manipulator: power supply, temperature controller, and servo motor control unit. Clean chamber and can be used for any materials. All sources are on 4.5” flanges. Effusion cells can be configured as required. Two valved crackers (as required). RF plasma source for either nitrogen or oxygen. Growth chamber pumps: 400 l/m ion pump and 10” cryo pump. Prep chamber pumps: 220 l/m ion pump. Load lock pumps: Sorption, mechanical, and turbo pumps. Three ion gauges and controllers. RHEED and QMS systems. Pyrometer. New software and PC. Bake out panels.配置
無配置OEM 代工型號說明
未提供文檔
無文檔