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VEECO / APPLIED EPI / VARIAN GEN II
    描述
    VEECO Gen II MBE Growth system, 3"
    配置
    (10) ports for dopants Process: Growth of arsenides and phosphides Liquid nitrogen Phase separator AlGaAs Laser Room temperature: 6°C - 10°C Vacuum: Growth chamber (GC) Triode ion pump: 400 l/sec Buffer chamber (BC) Triode ion pump: 200 l/sec (2) TSP Controllers Loadlock chamber (LC) (100) CTI Cryotor cryopumps (2) Vacshorption pumps Ventury pump In situ and calibration tools: RHEED System: 0-10 keV RHEED Oscillation growth rate calibration system Cells: EPI Valved cracker with valved controller Cable Riber three zone P Valved cracker with valve controller Power supply (4) 400g Sumo cells Ga, In, Al (2) Dopont cells Dual electronic equipment rack, 19" (12) Solenson DC power supplies Riber P valved cracker 2704 Dual channel Eurotherm controller Substrate and heated station (2) DC Power supplies Substrate heater Heated station
    OEM 代工型號說明
    未提供
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    已驗證

    類別
    Epitaxial deposition (EPI)

    上次驗證: 12 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    145622


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)
    年份: 2004條件: 二手
    上次驗證12 天前

    VEECO / APPLIED EPI / VARIAN

    GEN II

    verified-listing-icon
    已驗證
    類別
    Epitaxial deposition (EPI)
    上次驗證: 12 天前
    listing-photo-0b7cfe8258f24712881180c66f70d546-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    145622


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    VEECO Gen II MBE Growth system, 3"
    配置
    (10) ports for dopants Process: Growth of arsenides and phosphides Liquid nitrogen Phase separator AlGaAs Laser Room temperature: 6°C - 10°C Vacuum: Growth chamber (GC) Triode ion pump: 400 l/sec Buffer chamber (BC) Triode ion pump: 200 l/sec (2) TSP Controllers Loadlock chamber (LC) (100) CTI Cryotor cryopumps (2) Vacshorption pumps Ventury pump In situ and calibration tools: RHEED System: 0-10 keV RHEED Oscillation growth rate calibration system Cells: EPI Valved cracker with valved controller Cable Riber three zone P Valved cracker with valve controller Power supply (4) 400g Sumo cells Ga, In, Al (2) Dopont cells Dual electronic equipment rack, 19" (12) Solenson DC power supplies Riber P valved cracker 2704 Dual channel Eurotherm controller Substrate and heated station (2) DC Power supplies Substrate heater Heated station
    OEM 代工型號說明
    未提供
    文檔

    無文檔

    類似上架商品
    查看全部
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)年份: 2004條件: 二手上次驗證:12 天前
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)年份: 0條件: 二手上次驗證:29 天前
    VEECO / APPLIED EPI / VARIAN GEN II

    VEECO / APPLIED EPI / VARIAN

    GEN II

    Epitaxial deposition (EPI)年份: 0條件: 二手上次驗證:29 天前