VEECO / APPLIED EPI / VARIAN

GEN II

Details Attached 

MBE System 
- CTI-10 cryopump and a 400 l/s ion pump for ultra-pure epitaxial growth potential



Veeco MBE Gen II.pdf

A7716E55-AFDC-4AD2-81B1-C19E7AA5C7CF.jpeg

0B149611-E60A-4588-BE26-17D579304F70_4_5005_c.jpeg

D92723E5-0D24-44D2-8FAD-A729D987D0E2.jpeg

C748DF6C-3D8B-48BC-BBD7-AB3359E2A7D6.jpeg

705AA797-CBF0-4B97-99C8-50AE4063B981.jpeg

785A308D-F6AF-47FC-9806-047C9C946528.jpeg

B1CFAD4F-3B9A-4B61-B9F5-2419889D34EF.jpeg

0E4843F4-3926-4381-984F-B18719D3A7F5.jpeg

059F1271-58E3-4C73-9C05-E0A376079BC5.jpeg

E9B7AD09-3848-4CEB-AB8F-287CCDA3A529.jpeg

2AA60898-2A3A-49A2-8EC0-12B4F3E2B3C4.jpeg

EF46F889-A717-4306-9E4D-BE257FB7815B.jpeg

0278A86E-0349-458E-BC47-09C41B6D3B32.jpeg

A383FC2D-B5E5-438E-B8DD-6B90DCE773B4.jpeg

35573577-7F3B-4818-A7EE-D4CF1F16956F.jpeg

151ED5F9-FB18-43E0-87F5-EF5D78B5E386.jpeg

9B5C39AE-7408-4288-980C-4022B1F6CA3C.jpeg

4D01B5DA-9EB9-4548-930C-DC4D58399481.jpeg

D2E618F4-412F-405B-8C83-172E4002D08A_4_5005_c.jpeg

75C9FE90-4AAD-4B9C-9CAC-0955BD263E54.jpeg

81B2CA7B-ABBC-4C46-8864-2AF43DD348ED_4_5005_c.jpeg

F033D7EA-6B8B-424C-A047-FE4014CEAEC4_4_5005_c.jpeg

0ED82DC9-B939-48E7-AA52-152E72F304B6.jpeg

DA75A8C9-C0EC-4252-8C37-D3873798F5CA.jpeg

415D5181-F855-4440-AFAB-BABF9BB2E365.jpeg

A8DD9FE7-FBC8-4312-AC88-5728A8824634.jpeg

590C5F5D-BE1B-4983-B501-823D85231987.jpeg

43745A3A-3FFF-4B48-B6EE-5BEE94FBA527.jpeg

D8DB8FFD-CCA1-428A-BEC1-5C6946E190DB.jpeg

C297EC20-1930-4EC4-A648-7AB7B4481DEB.jpeg

9239F70A-CBC9-4FEA-BEF9-247E2E560123.jpeg

0E2C394F-1BBC-44F5-BA91-FB9BB659B151.jpeg

DD6C6A61-31CA-4D10-8719-08C3EED16B74.jpeg

6E671032-278F-4211-AA34-1351C405B569.jpeg

1C902F4C-30B6-4323-B7F4-6F4001EF917E_4_5005_c.jpeg

2A4F5A7F-ABC4-4EEA-9D75-5FA45D37EE2A.jpeg

420D4C0F-3DF8-4951-AC84-CBE55398B5C0_1_201_a.jpeg

F95A3A61-FB6F-4E3D-A229-D14E26E205DB.jpeg

5F736A6F-DA0B-4076-B395-640D4CA152F7_1_201_a.jpeg

E9D8AA35-FE01-49E6-B89F-E8DC60BB41FA.jpeg

323331D8-C997-4B1B-8D66-262157375C3F.jpeg

3F3C8F0B-84BD-4457-9F81-1D52362BB17C.jpeg

7F3A4D3E-427A-4808-93FC-76A1C9D7F7B1.jpeg

D547C90E-98BC-45BF-A356-18B6ADD695AD.jpeg

E0668292-0EC3-418E-A508-B32FD1871F6E.jpeg

C05F6F0B-1565-461C-9BA5-597F9429B373.jpeg

AF91F8BA-DFD5-4D9E-B614-39801A09AC86.jpeg

A23E5B94-5E51-4334-B1C8-C17A71FE32AF.jpeg

CEC7B9C5-B591-44EB-819A-CF2950390627.jpeg

72319841-69C1-4A0E-9350-7130D3853FEB_4_5005_c.jpeg

MBE MOD System 

Three Inch wafer, 8 sources.

Indium-free 10 sample holders with different profiles.

Substrate heater up to 1000 C.

Substrate manipulator: power supply, temperature controller, and servo motor control unit.

Clean chamber and can be used for any materials.

All sources are on 4.5” flanges.

Effusion cells can be configured as required.

Two valved crackers (as required).

RF plasma source for either nitrogen or oxygen.

Growth chamber pumps: 400 l/m ion pump and 10” cryo pump.

Prep chamber pumps: 220 l/m ion pump.

Load lock pumps: Sorption, mechanical, and turbo pumps.

Three ion gauges and controllers.

RHEED and QMS systems.

Pyrometer.

New software and PC.

Bake out panels.

CAE3D2EB-4B3B-4B8D-863F-2CE33769749B.png

A44E2796-317F-4799-B801-9ED50BFD9A0F.png

4D7B46C2-5468-4FC9-AA6E-D8C4E72C181D.png

0AD3C4A1-0EA7-4CA7-9F24-D14A127699F2.png

3E6300AD-2D1C-4B26-9E28-C9F2EE365701.png

48E9B63F-BDC3-4468-8F8A-3980621606F5.png

F41FB9B9-F14A-41D0-932A-4616AD536639.png

CF93AF16-5A1E-4372-8670-63509E374AEA.jpeg

CBD698B7-81FC-4F6B-86F8-7832D0CCDDFA.jpeg

7806B086-223E-4519-8043-97A75D5E3FD5.jpeg

B573B46D-A72D-4BBD-9248-7C076882E52A.jpeg

2CC275C4-44E1-4E30-B73F-F7AD4D4E0D8B.jpeg

CC5593AE-9476-46B3-B180-05BD7B1B883C_1_201_a.jpeg

GEN II

類別

概述

活躍中的上架商品

服務

最熱門的上架商品

VEECO / APPLIED EPI / VARIAN

GEN II

VEECO / APPLIED EPI / VARIAN

GEN II

VEECO / APPLIED EPI / VARIAN

GEN II

VEECO / APPLIED EPI / VARIAN

GEN II

利用 Moov 將其上架並立即找到完美的買家。

VEECO / APPLIED EPI / VARIAN

GEN II