描述
Miissing parts: Process Kits , Pyrometer Upper Wafer Size Range Minimum 200 mm Maximum 200 mm Set Size 200 mm Number of Chambers 2 Other Information Conversion June 2007 SPU to EPI System Exterior Dimensions Width 79.528 in (202.0 cm) Depth 81.496 in (207.0 cm) Height 95.669 in (243.0 cm) Weight 5,291 lb (2,400 kg)配置
無配置OEM 代工型號說明
Applied Centura RP (reduced pressure) Epi systems.文檔
無文檔
類別
Epitaxial deposition (EPI)
上次驗證: 4 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
147415
晶圓尺寸:
8"/200mm
年份:
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA RP EPI
類別
Epitaxial deposition (EPI)
上次驗證: 4 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
147415
晶圓尺寸:
8"/200mm
年份:
1996
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Miissing parts: Process Kits , Pyrometer Upper Wafer Size Range Minimum 200 mm Maximum 200 mm Set Size 200 mm Number of Chambers 2 Other Information Conversion June 2007 SPU to EPI System Exterior Dimensions Width 79.528 in (202.0 cm) Depth 81.496 in (207.0 cm) Height 95.669 in (243.0 cm) Weight 5,291 lb (2,400 kg)配置
無配置OEM 代工型號說明
Applied Centura RP (reduced pressure) Epi systems.文檔
無文檔