描述
CE Marked YES System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller Width 1,056.693 in (2,684.0 cm) Depth 986.220 in (2,505.0 cm) Height 944.882 in (2,400.0 cm) Weight 3,748 lb (1,700 kg)配置
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2 Power Requirements 208 V 100.0 A 50/60 Hz 3 Phase Software: Win 10 ; OR 4000 WTM Controller; 3x ENI Generator Racks, Chiller INR-498-011D; 2x Remote Monitor; High Density Plasma Process; Process Chambers: A,B,D; Orienter chamber F;Software: Win 10 ; OR 4000 WTM Controller; 3x ENI Generator Racks, Chiller INR-498-011D; 2x Remote Monitor; High Density Plasma Process; Process Chambers: A,B,D; Orienter chamber FOEM 代工型號說明
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.文檔
無文檔
類別
CVD
上次驗證: 18 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
150735
晶圓尺寸:
8"/200mm
年份:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA ULTIMA HDP-CVD
類別
CVD
上次驗證: 18 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
150735
晶圓尺寸:
8"/200mm
年份:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
CE Marked YES System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller Width 1,056.693 in (2,684.0 cm) Depth 986.220 in (2,505.0 cm) Height 944.882 in (2,400.0 cm) Weight 3,748 lb (1,700 kg)配置
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2 Power Requirements 208 V 100.0 A 50/60 Hz 3 Phase Software: Win 10 ; OR 4000 WTM Controller; 3x ENI Generator Racks, Chiller INR-498-011D; 2x Remote Monitor; High Density Plasma Process; Process Chambers: A,B,D; Orienter chamber F;Software: Win 10 ; OR 4000 WTM Controller; 3x ENI Generator Racks, Chiller INR-498-011D; 2x Remote Monitor; High Density Plasma Process; Process Chambers: A,B,D; Orienter chamber FOEM 代工型號說明
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.文檔
無文檔