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APPLIED MATERIALS (AMAT) P5000 CVD
    描述
    2 Teos DLH
    配置
    2C/H
    OEM 代工型號說明
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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    已驗證

    類別
    CVD

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    76120


    晶圓尺寸:

    8"/200mm


    年份:

    2000


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD
    年份: 1995條件: 二手
    上次驗證20 天前

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon
    已驗證
    類別
    CVD
    上次驗證: 超過60天前
    listing-photo-9e203e39eec6434e911a21273e1a6c7c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2205/9e203e39eec6434e911a21273e1a6c7c/1565fa6ddb2a449bb341456b043196dc_1_mw.jpg
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    76120


    晶圓尺寸:

    8"/200mm


    年份:

    2000


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    2 Teos DLH
    配置
    2C/H
    OEM 代工型號說明
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    文檔

    無文檔

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