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APPLIED MATERIALS (AMAT) P5000 CVD
    描述
    Mark1, 2xDLH PECVD , 5"
    配置
    無配置
    OEM 代工型號說明
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon

    已驗證

    類別
    CVD

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    72821


    晶圓尺寸:

    5"/125mm


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD
    年份: 1990條件: 二手
    上次驗證14 天前

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon
    已驗證
    類別
    CVD
    上次驗證: 超過60天前
    listing-photo-97da8e5d7dc743a9b03628b84735e50b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2056/97da8e5d7dc743a9b03628b84735e50b/f5ec1a7c93d8434986ac8e9a4279719b_40057784cd9e4f0a8cc2b2f3e1c825101201a_mw.jpeg
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    72821


    晶圓尺寸:

    5"/125mm


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Mark1, 2xDLH PECVD , 5"
    配置
    無配置
    OEM 代工型號說明
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    文檔

    無文檔

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