描述
10/1/26 System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller; Tool will be sold without SoftwareAMAT Vita/Delphin Controller Width 1,056.693 in (2,684.0 cm) Depth 986.220 in (2,505.0 cm) Height 944.882 in (2,400.0 cm) Weight 3,748 lb (1,700 kg)配置
Process Gases - PH3, SiH4, NF3, He, Argon, O2 Power Requirements - 208 V 100.0 A 50/60 Hz 3 PhaseOEM 代工型號說明
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.文檔
無文檔
類別
CVD
上次驗證: 11 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
148153
晶圓尺寸:
8"/200mm
年份:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA HDP
類別
CVD
上次驗證: 11 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
148153
晶圓尺寸:
8"/200mm
年份:
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
10/1/26 System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller; Tool will be sold without SoftwareAMAT Vita/Delphin Controller Width 1,056.693 in (2,684.0 cm) Depth 986.220 in (2,505.0 cm) Height 944.882 in (2,400.0 cm) Weight 3,748 lb (1,700 kg)配置
Process Gases - PH3, SiH4, NF3, He, Argon, O2 Power Requirements - 208 V 100.0 A 50/60 Hz 3 PhaseOEM 代工型號說明
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.文檔
無文檔