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SEMSYSCO TRITON
  • SEMSYSCO TRITON
  • SEMSYSCO TRITON
  • SEMSYSCO TRITON
描述
Au Plating, Au Etch and Au Depla
配置
無配置
OEM 代工型號說明
From its inception to the first delivery in 2013, the Triton platform was designed to be a stable but modular workhorse for all single-wafer wet-processes. The modular build of our tools enables our customer to configure the tool for a mass-production single-process tool as well as a swiss-army knife R&D or prototyping tool – without affecting performance or reliability. -Processing of 3” to 450 mm substrates -Possibility of processing two to three different substrate sizes with minimal or no reconfiguration – and no requalification of the chamber -Patented High-Speed Plating for better throughput and better uniformity – without changing the chemistry
文檔

無文檔

類別
Wet Benches - Auto

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

81984


晶圓尺寸:

未知


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

SEMSYSCO

TRITON

verified-listing-icon
已驗證
類別
Wet Benches - Auto
上次驗證: 超過60天前
listing-photo-a446b7922c054345b1d65e52deae1a11-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

81984


晶圓尺寸:

未知


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Au Plating, Au Etch and Au Depla
配置
無配置
OEM 代工型號說明
From its inception to the first delivery in 2013, the Triton platform was designed to be a stable but modular workhorse for all single-wafer wet-processes. The modular build of our tools enables our customer to configure the tool for a mass-production single-process tool as well as a swiss-army knife R&D or prototyping tool – without affecting performance or reliability. -Processing of 3” to 450 mm substrates -Possibility of processing two to three different substrate sizes with minimal or no reconfiguration – and no requalification of the chamber -Patented High-Speed Plating for better throughput and better uniformity – without changing the chemistry
文檔

無文檔