描述
Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.配置
0.11 0.82 4:1 26*33 20 20OEM 代工型號說明
Step-and-Repeat Scanning System NSR-S207D, a lens-scanning KrF excimer stepper for mass production of 110nm advanced devices incorporating an ultra-high N.A. lens. The NSR-S207D incorporates an ultra-high N.A. (N.A.O.82) projection lens, for the KrF excimer laser (248nm wavelength), and uses a newly developed body to significantly improve throughput performance and alignment accuracy.文檔
無文檔
NIKON
NSR-S207D
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
131675
晶圓尺寸:
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.配置
0.11 0.82 4:1 26*33 20 20OEM 代工型號說明
Step-and-Repeat Scanning System NSR-S207D, a lens-scanning KrF excimer stepper for mass production of 110nm advanced devices incorporating an ultra-high N.A. lens. The NSR-S207D incorporates an ultra-high N.A. (N.A.O.82) projection lens, for the KrF excimer laser (248nm wavelength), and uses a newly developed body to significantly improve throughput performance and alignment accuracy.文檔
無文檔