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描述
-Currently installed in demonstration cleanroom in working condition.配置
• High Throughput A New illuminator design, along with a reduced stepping and alignment time, allows a high throughput of 103 wafers per hour (for 200mm wafers). • High Resolution and Modified Illumination The NSR-2205i14E2 with a projection lens with a top N.A. of 0.63 which, taken with modified illumination technology, enables resolution of 0.35μm or better. With Resolution Enhanced Technology (RET) and variable-N.A. reticle design, the systemcan handle a wide range of process parameters and diverse process requirements, including rough and middle layers. • Overall Alignment Accuracy The i14E2’s reticle interferometer system improves alignment accuracy, including chip rotation correction and staging accuracy. Thanks to enhanced baseline measurement and internal chip accuracy (chip magnification, chip rotation),overlay has been significantly improved. • Refined Operation Interface The operation has been enhanced through software improvements. An extensive lineup of measurement evaluation and maintenance software provides the right answer for all your requirements. Specifications Resolution: 0.35μm or better N.A.: 0.63 Exposure light source: i line Reduction ratio:1:5 Exposure field size: 22mm square to 17.9 (H) x 25.2 (V)mm Alignment accuracy (EGA, |x|+3σ):40nm or better Alignment system:LSA(standard), FIA(standard), LIA(optional)OEM 代工型號說明
For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).文檔
無文檔
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
42825
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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NSR-2205i14E2
類別
Steppers & Scanners
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
42825
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
-Currently installed in demonstration cleanroom in working condition.配置
• High Throughput A New illuminator design, along with a reduced stepping and alignment time, allows a high throughput of 103 wafers per hour (for 200mm wafers). • High Resolution and Modified Illumination The NSR-2205i14E2 with a projection lens with a top N.A. of 0.63 which, taken with modified illumination technology, enables resolution of 0.35μm or better. With Resolution Enhanced Technology (RET) and variable-N.A. reticle design, the systemcan handle a wide range of process parameters and diverse process requirements, including rough and middle layers. • Overall Alignment Accuracy The i14E2’s reticle interferometer system improves alignment accuracy, including chip rotation correction and staging accuracy. Thanks to enhanced baseline measurement and internal chip accuracy (chip magnification, chip rotation),overlay has been significantly improved. • Refined Operation Interface The operation has been enhanced through software improvements. An extensive lineup of measurement evaluation and maintenance software provides the right answer for all your requirements. Specifications Resolution: 0.35μm or better N.A.: 0.63 Exposure light source: i line Reduction ratio:1:5 Exposure field size: 22mm square to 17.9 (H) x 25.2 (V)mm Alignment accuracy (EGA, |x|+3σ):40nm or better Alignment system:LSA(standard), FIA(standard), LIA(optional)OEM 代工型號說明
For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).文檔
無文檔