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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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ASML TWINSCAN XT:1400F
    描述
    無描述
    配置
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    OEM 代工型號說明
    The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.
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    ASML

    TWINSCAN XT:1400F

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    已驗證

    類別
    Steppers & Scanners

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    90829


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
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    ASML TWINSCAN XT:1400F

    ASML

    TWINSCAN XT:1400F

    Steppers & Scanners
    年份: 0條件: 二手
    上次驗證超過60天前

    ASML

    TWINSCAN XT:1400F

    verified-listing-icon
    已驗證
    類別
    Steppers & Scanners
    上次驗證: 超過60天前
    listing-photo-427468ab149444cb820c0976783a84ec-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    90829


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.
    文檔

    無文檔

    類似上架商品
    查看全部
    ASML TWINSCAN XT:1400F

    ASML

    TWINSCAN XT:1400F

    Steppers & Scanners年份: 0條件: 二手上次驗證:超過60天前
    ASML TWINSCAN XT:1400F

    ASML

    TWINSCAN XT:1400F

    Steppers & Scanners年份: 0條件: 二手上次驗證:超過60天前