跳到主要內容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 閱讀詳情

Moov logo

Moov Icon
ASML TWINSCAN XT:1400F
  • ASML TWINSCAN XT:1400F
  • ASML TWINSCAN XT:1400F
  • ASML TWINSCAN XT:1400F
描述
無描述
配置
ASML TWINSCAN XT:1400F 193nm (ArF) Scanner Lithography Equipment Equipment details: Currently Configured for: 300mm Current Equipment Status: Available Asset HDD not included • Cymer XLA-165 45 W. 4kHz laser • 4 FOUP Loadports • Projection Lens The Starlith Aerial E illumination system Quasar illumination module Beam Delivery syst • Alignment System o Wafer alignment using ATHENA o Reticle BLUE alignment o ATHENA narrow marks o TOP 1 and TOP 2 • Lot streaming Scanning stages Wafer handling Exposure chucks Lot overhead reduction • Focus control and field by field leveling Focus Spot Monitoring CD-FEDC LS MATCH2 • Reticle shape correction • System calibration and image quality control in-situ metrology (ILIAS SAMOS) Lithoguide Pupicom Dos • UNIX/SUN Architecture for user interface • Reticle management reticle error compensation • DOE Low Sigma 193 • Aux Port 300mm FOUP/25 wafer • IRIS for Twinscan 6 Inch • Integrated reticle library
OEM 代工型號說明
The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.
文檔
類別
Steppers & Scanners

上次驗證: 23 天前

關鍵商品詳情

條件:

Used


作業狀態:

Deinstalled


產品編號:

128947


晶圓尺寸:

12"/300mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

ASML

TWINSCAN XT:1400F

verified-listing-icon
已驗證
類別
Steppers & Scanners
上次驗證: 23 天前
listing-photo-203fce606d5646ee9e266e9ec12d6f4d-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

Deinstalled


產品編號:

128947


晶圓尺寸:

12"/300mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
ASML TWINSCAN XT:1400F 193nm (ArF) Scanner Lithography Equipment Equipment details: Currently Configured for: 300mm Current Equipment Status: Available Asset HDD not included • Cymer XLA-165 45 W. 4kHz laser • 4 FOUP Loadports • Projection Lens The Starlith Aerial E illumination system Quasar illumination module Beam Delivery syst • Alignment System o Wafer alignment using ATHENA o Reticle BLUE alignment o ATHENA narrow marks o TOP 1 and TOP 2 • Lot streaming Scanning stages Wafer handling Exposure chucks Lot overhead reduction • Focus control and field by field leveling Focus Spot Monitoring CD-FEDC LS MATCH2 • Reticle shape correction • System calibration and image quality control in-situ metrology (ILIAS SAMOS) Lithoguide Pupicom Dos • UNIX/SUN Architecture for user interface • Reticle management reticle error compensation • DOE Low Sigma 193 • Aux Port 300mm FOUP/25 wafer • IRIS for Twinscan 6 Inch • Integrated reticle library
OEM 代工型號說明
The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.
文檔