概述

The TWINSCAN XT:1400F is a dual-stage ArF lithography system designed for 200-mm and 300-mm wafers at 65-nm resolution. It employs a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, pushing ArF technology beyond 65-nm. Its dual wafer-stage enables simultaneous exposure and alignment, maximizing productivity. The system ensures comprehensive focus control, especially on edge dies, and with its 45-W ArF laser, achieves a throughput of 133 300-mm wph and 165 200-mm wph efficiently. Designed for extreme low-k1 operations, it enhances process precision and offers built-in metrology for advanced process tracking.