概述

SU3500 low-vacuum SEM, Hitachi High-Tech improved SEM image observation capacity by completely overhauling the electron optics system, enabling secondary electron imaging at a resolution of 7 nm at 3 kV, and back-scattered electron imaging at a resolution of 10 nm at 5 kV. Redesigned signal processing technology, meanwhile, allows for observation of brighter images with less noise even during fast scanning speeds. These key changes now make it possible to retain a high degree of operability even when focusing or stigma adjustments.