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HITACHI SU3500
  • HITACHI SU3500
  • HITACHI SU3500
  • HITACHI SU3500
描述
SEM
配置
SEM, Secondary Electron Detector, Reflection Electron Detector, Low Vacuum Secondary Electron Detector, EDX (AMETEC Octane Plus), MC1000 ion Sputter, Etc.
OEM 代工型號說明
SU3500 low-vacuum SEM, Hitachi High-Tech improved SEM image observation capacity by completely overhauling the electron optics system, enabling secondary electron imaging at a resolution of 7 nm at 3 kV, and back-scattered electron imaging at a resolution of 10 nm at 5 kV. Redesigned signal processing technology, meanwhile, allows for observation of brighter images with less noise even during fast scanning speeds. These key changes now make it possible to retain a high degree of operability even when focusing or stigma adjustments.
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已驗證

類別
SEM / FIB

上次驗證: 超過30天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

116070


晶圓尺寸:

未知


年份:

2016


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

HITACHI

SU3500

verified-listing-icon
已驗證
類別
SEM / FIB
上次驗證: 超過30天前
listing-photo-09986ff60de74e73ade03119baaa99e9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

116070


晶圓尺寸:

未知


年份:

2016


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
SEM
配置
SEM, Secondary Electron Detector, Reflection Electron Detector, Low Vacuum Secondary Electron Detector, EDX (AMETEC Octane Plus), MC1000 ion Sputter, Etc.
OEM 代工型號說明
SU3500 low-vacuum SEM, Hitachi High-Tech improved SEM image observation capacity by completely overhauling the electron optics system, enabling secondary electron imaging at a resolution of 7 nm at 3 kV, and back-scattered electron imaging at a resolution of 10 nm at 5 kV. Redesigned signal processing technology, meanwhile, allows for observation of brighter images with less noise even during fast scanning speeds. These key changes now make it possible to retain a high degree of operability even when focusing or stigma adjustments.
文檔

無文檔