描述
無描述配置
Hitachi SEM S-4700 with EDAXOEM 代工型號說明
The S-4700 Type I is a cutting-edge electron microscope with remarkable features. It offers high-resolution imaging at low accelerating voltages, ensuring a guaranteed resolution of 2.1 nm at 1 kV. Routine microscopy is made convenient with a long working distance of 12 mm, allowing sample exchange via an airlock without the need for repositioning. At 15 kV, the microscope maintains a high resolution of 1.5 nm. Additionally, it enables a sample tilt of 45 degrees without altering the working distance and offers a high X-ray take-off angle of 30 degrees with the sample normal to the beam. The instrument boasts an integrated electron detector for both secondary electrons (SE) and backscattered electrons (BSE), allowing operators to choose the best imaging mode for their samples. With complete column setup controlled through a computer interface, users can effortlessly switch between ultra-high-resolution mode and analysis mode. The unique objective lens design permits simultaneous use of YAG-type BSE and EDX detectors, enhancing imaging versatility.文檔
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HITACHI
S-4700 I
已驗證
類別
SEM
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
97671
晶圓尺寸:
未知
年份:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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HITACHI
S-4700 I
類別
SEM
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
97671
晶圓尺寸:
未知
年份:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Hitachi SEM S-4700 with EDAXOEM 代工型號說明
The S-4700 Type I is a cutting-edge electron microscope with remarkable features. It offers high-resolution imaging at low accelerating voltages, ensuring a guaranteed resolution of 2.1 nm at 1 kV. Routine microscopy is made convenient with a long working distance of 12 mm, allowing sample exchange via an airlock without the need for repositioning. At 15 kV, the microscope maintains a high resolution of 1.5 nm. Additionally, it enables a sample tilt of 45 degrees without altering the working distance and offers a high X-ray take-off angle of 30 degrees with the sample normal to the beam. The instrument boasts an integrated electron detector for both secondary electrons (SE) and backscattered electrons (BSE), allowing operators to choose the best imaging mode for their samples. With complete column setup controlled through a computer interface, users can effortlessly switch between ultra-high-resolution mode and analysis mode. The unique objective lens design permits simultaneous use of YAG-type BSE and EDX detectors, enhancing imaging versatility.文檔
無文檔