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描述
Hitachi SU8040 w/o EDS配置
Process Type: FA SEMs/TEMs/Dual Beams Specification: Secondary electron image resolution: 1.0nm (15kV, WD=4mm) 1.3nm (1kV, WD=1.5mm, Deceleration mode) Secondary electron detectors: Top, upper and lower Magnification: LM mode: 20 ~ 2,000X HM mode: 100 ~ 800,000X Specimen Stage: Stage Motorization: 5 Axis Hitachi Regulus Stage Type I: X: 0 ~ 110mm; Y: 0 ~ 80mm, Z: 1.5 ~ 40mm; T: -5 ~ +70 deg, R: 360 deg. Maximum sample size: 150mm Stage Repeatability less than +/- 0.5 microns Configuration: Operating System: Windows 7 Options: EDX, BSE, STEMOEM 代工型號說明
the SU8040 that features a newly developed Regulus Stage. The Regulus stage has the capability that can be operated smoothly even at ultra high resolution. The Regulus stage has adopted a high reliable conventional motor drive, but the capability has been greatly improved thanks to the newly developed motor drivetrain. Now the Regulus stage can achieve seamless stage operation and high throughput observation without any stress.文檔
無文檔
HITACHI
SU8040
類別
SEM / FIB
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
117550
晶圓尺寸:
未知
年份:
2012
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描述
Hitachi SU8040 w/o EDS配置
Process Type: FA SEMs/TEMs/Dual Beams Specification: Secondary electron image resolution: 1.0nm (15kV, WD=4mm) 1.3nm (1kV, WD=1.5mm, Deceleration mode) Secondary electron detectors: Top, upper and lower Magnification: LM mode: 20 ~ 2,000X HM mode: 100 ~ 800,000X Specimen Stage: Stage Motorization: 5 Axis Hitachi Regulus Stage Type I: X: 0 ~ 110mm; Y: 0 ~ 80mm, Z: 1.5 ~ 40mm; T: -5 ~ +70 deg, R: 360 deg. Maximum sample size: 150mm Stage Repeatability less than +/- 0.5 microns Configuration: Operating System: Windows 7 Options: EDX, BSE, STEMOEM 代工型號說明
the SU8040 that features a newly developed Regulus Stage. The Regulus stage has the capability that can be operated smoothly even at ultra high resolution. The Regulus stage has adopted a high reliable conventional motor drive, but the capability has been greatly improved thanks to the newly developed motor drivetrain. Now the Regulus stage can achieve seamless stage operation and high throughput observation without any stress.文檔
無文檔