描述
無描述配置
A. Dual beam B. TLD and CDEM Detectors C. Integrated EDS Detector D. ELSTAR UHR Electron column E. Sidewinder Ion column F. Omni probe nanomanipulator G. Plasma cleaner H. Vacuum system I. (3) IGPs J. Water-cooled turbo and dry PVP K. 5-Axis (X, Y, Z, R, Tilt), Compucentric stage, 300 mm piezo L. GIS chemistries: IEE, EE, C, Pt, W, H20, IDEP M. Gas injection system: Maximum (4) Injectors, 1 Included, Pt/W N. Operating system: Windows OSOEM 代工型號說明
Helios NanoLab 1200 Full Wafer DualBeam Technology for High Resolution Imaging, Analysis and TEM Sample Preparation for 300 mm Wafers文檔
無文檔
類別
SEM / FIB
上次驗證: 3 天前
關鍵商品詳情
條件:
Used
作業狀態:
Installed / Running
產品編號:
149104
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
THERMOFISHER SCIENTIFIC / FEI / PHILIPS
HELIOS NANOLAB 1200
類別
SEM / FIB
上次驗證: 3 天前
關鍵商品詳情
條件:
Used
作業狀態:
Installed / Running
產品編號:
149104
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
A. Dual beam B. TLD and CDEM Detectors C. Integrated EDS Detector D. ELSTAR UHR Electron column E. Sidewinder Ion column F. Omni probe nanomanipulator G. Plasma cleaner H. Vacuum system I. (3) IGPs J. Water-cooled turbo and dry PVP K. 5-Axis (X, Y, Z, R, Tilt), Compucentric stage, 300 mm piezo L. GIS chemistries: IEE, EE, C, Pt, W, H20, IDEP M. Gas injection system: Maximum (4) Injectors, 1 Included, Pt/W N. Operating system: Windows OSOEM 代工型號說明
Helios NanoLab 1200 Full Wafer DualBeam Technology for High Resolution Imaging, Analysis and TEM Sample Preparation for 300 mm Wafers文檔
無文檔